Study and Development of a Simulation Tool for Optical Lithography
نویسندگان
چکیده
This paper presents a study and the implementation of a optical simulation tool based on wavelets. After this initial study it will be possible to implement resolution enhancement techniques (RET) such as optical proximity correction (OPC) and double patterning. Optical lithography simulation is an essential step to a Design for Manufacturability (DFM) flow. Simulation is used in mask printability enhancement methods. Mask printability is improved by creating a modified mask for which the printed features resemble closely the features on the original mask. However lithography simulation is a compute intense task and a fast simulation is required to allow feasible mask correcting algorithms.
منابع مشابه
Lithography Simulation in Semiconductor Manufacturing
In the 30 years since lithography modeling was first introduced, optical lithography simulation has progressed from a curiosity, to a research and development tool, and finally to a manufacturing tool. While much has been published on new developments in lithography simulators and their use in advanced lithography development, less is published on how simulators have been used and are soon to b...
متن کاملFabrication and Optical Characterization of Silicon Nanostructure Arrays by Laser Interference Lithography and Metal-Assisted Chemical Etching
In this paper metal-assisted chemical etching has been applied to pattern porous silicon regions and silicon nanohole arrays in submicron period simply by using positive photoresist as a mask layer. In order to define silicon nanostructures, Metal-assisted chemical etching (MaCE) was carried out with silver catalyst. Provided solution (or materiel) in combination with laser interference lithogr...
متن کاملComparison of ScintSim1 and Geant4 Monte Carlo simulation codes for optical photon transport in thick segmented scintillator arrays
Introduction: Arrays of segmented scintillation crystals are useful in megavoltage x-ray imaging detectors for image-guided radiotherapy. Most previous theoretical studies on these detectors have modelled only ionizing-radiation transport. Scintillation light also affects detector performance. ScintSim1, our previously reported optical Monte Carlo code for such detector...
متن کاملComputer Simulation from Electron Beam Lithography to Optical Lithography
Simulation of electron beam lithography and optical lithography has been combined to investigate the influence of a distorted photomask feature on final photoresist image. Unlike the previous optical lithography simulation which was based on ideal mask design, the combined simulation has shown that mask distortion due to electron proximity effect play an important role in worsening the optical ...
متن کاملContextualization and validation of the interprofessional collaborator assessment rubric (ICAR) through simulation: Pilot investigation
Background: Simulation can be used for educating, evaluating and assessing psychometric properties of an instrument. The aim of this study was to contextualize and assess the validity and reliability of the Interprofessional Collaborative Assessment tool (ICAR) in an Iranian context using simulation. Methods: In this descriptive study, contextualization of the ICAR was assessed throug...
متن کامل